For data center applications, Intel announced at its 2020 Architecture Day, held online, that its next-generation Xeon Scalable processors, designed with a 10nm process and Ice Lake architecture, will officially ship by the end of the year. The processor, codenamed Sapphire Rapids, is also unveiled and built on 10nm SuperFin process technology, expected to be the next Xeon Scalable processor.
According to Intel, the next-generation Xeon Scalable processors will utilize the 10nm Ice Lake architecture and are expected to ship by the end of this year. These will be the third-generation Xeon Scalable processors, following the Cooper Lake architecture. They will feature full memory encryption, support for PCIe 4.0 and eight memory channels, and enhanced cryptographic instruction sets.
Processor products used in network storage and the Internet of Things will also be released in versions using the Ice Lake architecture in the future.
Intel also announced its next Xeon Scalable processor, codenamed Sapphire Rapids and designed using 10nm SuperFin process technology. It will support DDR5 memory, PCIe 5.0, and Compute Express Link 1.1 connectivity specifications, as well as a new accelerator called Advanced Matrix Extensions (AMX), expanding Intel's AI acceleration capabilities.
Sapphire Rapids is expected to enter mass production and supply in the second half of next year, and will become the processor used in the Aurora Exascale supercomputer system at the Argonne National Laboratory in the United States.
As for the software part, which is the outermost of the six aspects of Intel's processor product performance planning, the oneAPI Gold version will be launched at the end of this year, allowing developers to fully utilize the processor's computing performance through the software level. Currently, Intel has released the 8th version of oneAPI beta content for developers, allowing developers to meet the computing needs of Intel's processors through a single coding, thereby simplifying the application service development process and difficulty.
